Summary: With a handful of functions and dependencies, PECVD systems thrive when used for industrial purposes.
Plasma-enhanced chemical vapor deposition systems are typically used for substrates that have a low thermal budget requirement. As a result, the plasma of the reacting gases that are formed in the electric field allow reactions to occur – allowing for the deposition at low temperatures. This is one of the primary factors of PECVD that this article will discuss. Additionally, the benefits of using PECVD systems are plentiful and will also be dissected so you can ensure that this system is right for your needs.
Many PECVD systems are designed and manufactured for industrial applications. Not to say that other applications are in fact extinct, but many companies and business utilize this method within this setting. Be sure that you pick and choose what wafer size you want your PECVD brand system to size up to – anywhere from 4” and above is ideal for a universal fit.
While each system varies in terms of functionality and purpose, many processing systems are designed to have universal benefits such as: high purity and reproducibly environment, automatic noncontact loading system, temperature controls, etc. These factors all play a role in the substrate’s end result. Ideally, you’ll want a system that will be both flexible and versatile for the user, allowing him or her to work on projects with ease. Certain systems also include a real time processing control system that allows for data logging and recipe editing.
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